Hafnium Sputtering Target
Crystal Grade High Purity
Hafnium (Hf) is a lustrous, silver grey metal. Hafnium-based thin films are used as an insulator in the newer generations of semiconductors. The thin film prevents copper diffusion into silicon. Amorphous hafnium oxide has a high dielectric constant, it allows reduction of the gate leakage current and improves performance of the electronics.
Hafnium is found in zirconium minerals; it is difficult to separate these 2 elements due to their chemical resemblance. Our hafnium sputtering target is made from refined crystal bar which ensures low zirconium content, high purity and high reliability.
- 4N (99.99%) pure, excluding zirconium (Zr)
- ACH10: Zirconium (Zr) < 1.0 wt%
- ACH05: Zirconium (Zr) < 0.5 wt%
- 17.5” diameter max
- 16” x 55” max