Tantalum Sputtering Targets

Tantalum Sputtering target grain size

Tantalum Sputtering target

Admat can supply discs as large as 29" diameter

Our tantalum sputtering target material has high purity, fine and uniform grain size, and is perfect for semiconductor applications. We can produce material as plates, discs, rings, and crucibles. Send Admat your specifications for review.

Tantalum sputtering target grain size

Typical Sputtering-Grade Tantalum Purity (ppm)
Impurities 5N Ta 4N5 Ta 4N Ta 3N5 Ta
Fe <1 <1 <1 <5
Ni <1 <1 <1 <5
Cr <1 <1 <1 <5
Cu <1 <1 <1 <5
Ti <1 <1 <1 <5
Nb <10 <50 <100 <500
W <8 <10 <30 <150
Mo <5 <10 <10 <30
Na <0.4 <0.4 <1 <5
Li <0.1 <0.1 <1 <5
K <0.4 <0.4 <1 <5
U <0.001 <0.005 <0.005 <0.005
Th <0.001 <0.005 <0.005 <0.005
Others <0.1 <1 <5 <10
C <10 <10 <20 <30
O <50 <50 <100 <200
N <30 <30 <30 <50
H <5 <5 <10 <10

Notes:
For guidance only. Specifications determined with customers.
Metallic impurities measured by GDMS 4N and higher purity materials.
Gaseous impurities measured by LECO



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